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This paper reports experimental observations showing that a current flow produces an effect of strengthening a solder joint against a shear load. This conclusion is found from a single-joint shear test conducted on Sn–1Ag–0.5Cu wt% (SAC 105) joints with in situ current stressing varied from 700 to 1400 A/cm2 at room temperature. To isolate the current effect from the Joule heat effect, the same type of tests were conducted at room temperature, 40, 50, and 80 °C, without current applied to the joint, thus mimicking the condition of steady-state temperature resulting from Joule heating. Comparative testing was also conducted after aging the samples at 150 °C for 200 h. These tests produced indications suggesting that the current flow causes the maximum shear load to increase, while the rise in temperature by the Joule heat effect results in the opposite effect. Experimentally, as much as a 9.5% increase in the maximum shear load was observed from the isothermally aged sample tested under a current density of 700 A/cm2, while an ~ 25% reduction was estimated to result from a temperature increase by Joule heating. The potential mechanism for these observations is discussed.

This paper reports experimental observations evidencing that the intermetallic compound phase interfaced with Cu in the Al-Cu diffusion couple is most likely α2-Cu3Al phase, not γ-Cu9Al4 phase as previously assumed, and that its growth to a critical thickness may result in interface failure by stress-driven fracture. These conclusions are made based on an interdiffusion study of a diffusion couple made of a thick Cu plate coated with ∼ 2-μm-thick Al thin film. The interface microstructure and lattice parameter were characterized using scanning electron microscopy and x-ray diffraction analysis. Specimens aged at temperature between 623 K (350°C) and 723 K (450°C) for various hours produced consistent results supporting the main conclusions. It is found that disordered α2-Cu3Al phase grows in a similar manner to solid-state epitaxy, probably owing to its structural similarity to the Cu lattice. The increase in the interface strain that accompanies the α2-Cu3Al phase growth ultimately leads to interface fracture proceeding from crack initiation and growth along the interface. This mechanism provides the most consistent explanation for interface failures observed in other studies.

The mechanical stability of Sn-Ag-Cu interconnects with low and high silver content against mechanical shock at room and elevated temperatures was investigated. With a heating element-embedded printed circuit board design, a test temperature from room temperature to 80°C was established. High impact shock tests were applied to isothermally pre-conditioned ball-grid array interconnects. Under cyclic shock testing, degradation and improved shock performances were identified associated with test temperature variation and non-solder mask defined and solder-mask defined pad design configuration differences. Different crack propagation paths were observed, induced by the effect of the elevated temperature test conditions and isothermal aging pre-conditions.

The mechanical stability and thermo-mechanical fatigue performance of solder joints with low silver content Sn-1.0Ag-0.5Cu (wt.%) (SAC105) alloy based on different cooling rates are investigated in high G level shock environment and thermal cycling conditions. The cooling rate-controlled samples ranging from 1°C/min to 75°C/min cooling rate, not only show differences in microstructure, where a fine poly-granular microstructure develops in the case of fast cooling versus normal cooling, but also show various shock performances based on the microstructure changes. The fast cooling rate improves the high G shock performance by over 90% compared to the normal cooled SAC105 alloy air-cooling environment commonly used after assembly reflow. The microstructure effect on thermal cycling performance is also discussed, which is analyzed based on the Sn grain orientation, interconnect stability, and solder joint bulk microstructure.

The impact of isothermal aging and recrystallized grain structure distribution on mechanical shock and thermal cycling performance of solder joints with 1% and 3% silver content Sn-Ag-Cu interconnects were investigated. Localized recrystallized grain structure distributions were analyzed to identify correlations between the microstructure evolution and shock performance. The results reveal that the shock tolerance depends on the amount of shock energy that can be absorbed during each shock cycle, which depends on microstructural features. Based on the recrystallized grain distribution, additional isothermal aging in 1% silver Sn-Ag-Cu interconnects shows improved shock performance, whereas degraded shock performance was observed in 3% Sn-Ag-Cu interconnects. Using the same grain boundary distribution analysis on thermally cycled samples, relationships between the particle size distribution, localized recrystallized grain structure development, shock, and thermomechanical performance were identified: finer particle spacing is beneficial for thermal cycling as it resists grain boundary generation, while conversely, wider particle spacing facilitates recrystallization and grain boundary mobility that allows Sn to absorb shock energy.

This article summarizes the mechanics of two mechanical fatigue methods, cyclic bending fatigue and shear fatigue, in inducing failure in solder joints in package assemblies, and it presents the characteristics of fatigue failures resulting from these methods using example cases of Sn-Pb eutectic and Sn-rich Pb-free solder alloys. Numerical simulation suggests that both testing configurations induce fatigue failure by the crack-opening mode. In the case of bending fatigue, the strain induced by the bending displacement is found to be sensitive to chip geometry, and it induces fatigue cracks mainly at the solder matrix adjacent to the printed circuit board interface. In case of shear fatigue, the failure location is firmly fixed at the solder neck, created by solder mask, where an abrupt change in the solder geometry occurs. Both methods conclude that the Coffin–Manson model is the most appropriate model for the isothermal mechanical fatigue of solder alloys. An analysis of fatigue characteristics using the frame of the Coffin–Manson model produces several insightful results, such as the reason why Pb-free alloys show higher fatigue resistance than Sn-Pb alloys even if they are generally more brittle. Our analysis suggests that it is related to higher work hardening. All these results indicate that mechanical fatigue can be an extremely useful method for fast screening of defective package structures and also in gaining a better understanding of fatigue failure mechanism and prediction of reliability in solder joints.

This paper examines the mechanics of ball shear testing with the objective of understanding the mechanism by which the maximum shear force and the rate of crack growth is dependent on the solder bump size. For this, Pb-Sn solder bumps with diameters between 460 lm and 760 lm are soldered to 400 lm-diameter Cu pads and subjected to ball shear testing. In spite of the constant interface area, the bump size significantly impacts the measured shear fracture force and the crack growth rate. Both the fracture force and the crack growth rate increase with bump size, and in the case of the fracture force, the increase is almost linear. Our analysis finds that the linear increase in the fracture force is a result of the bump deformation force, which increases with bump size. A simple model that accounts for the deformation force component is developed and used to extract the true interface fracture force. The estimated true interface fracture force is found to vary little with bump size, tightly converging to the 40 MPa to 48 MPa range. On the other hand, the dependence of crack growth rate on bump size is found to result from the higher degree of rotational moment associated with larger bumps.

This paper is concerned with the mechanics of interfacial fracture that are active in two common testing configurations of solder joint reliability. Utilizing eutectic Pb-Sn/Cu as a reference system and assuming the presence of a predefined crack size in the intermetallic compound (IMC) layer, stress intensity factors (K I and K II) at the crack are numerically calculated for the two given configurations. The analysis of the tensile test configuration reveals that the fracture occurs by the crack-opening mode (K I mode), as anticipated, but that it is greatly assisted by the viscoplasticity of the solder. With nonuniform viscoplastic deformation across the joint, K I is found to increase much more rapidly than it would without the solder, decreasing the critical crack size to the micron scale. The same mechanism is also responsible for the development of a K II comparable to K I at the crack tip, that is, |K I /K II| ~ 1. It is also found that the predominant fracture mode in the bump shear configuration is crack opening, not crack shearing. This is an unexpected result, but numerical analyses as well as experimental observations provide consistent indications that fracture occurs by crack opening. During shear testing, bump rotation due to nonzero rotational moment in the test configuration is found to be responsible for the change in the fracture mode because the rotation makes K I become dominant over K II. With rotational moment being affected by the geometry of the bump, it is further found that the fracture behavior may vary with bump size or shape.

This paper illustrates the influence of Au addition on the phase equilibria of Sn-Ag-Cu (SAC) near-eutectic alloys and on the interface reaction with the Cu substrate. From the thermal and microstructural characterization of Sn-3.8Ag-0.7Cu alloys containing various amounts of Au, it is found that the Au promotes the formation of a quaternary-eutectic reaction at 204.5°C ± 0.3°C. The equilibrium phases in the quaternary-eutectic microstructure are found to be AuSn4, Ag3Sn, βSn, and Cu6Sn5. While the addition of Au to Sn-3.8Ag-0.7Cu alloys is also found to increase liquidus temperature and the temperature ranges of the phase equilibria field for primary phases, such influences from Au are found to be less pronounced when the alloys were reacted with the Cu substrate. Because of the formation of the Au-Cu-Sn-ternary interface intermetallic, it is found that a majority of Au added to the solder is drained from the melt. The drainage of Au reduces the impact of Au on the phase equilibria of the solder alloys in the joint. It is further found that the involvement of Au in the interface reaction results in a change of the interface phase morphology from the conventional scallop structure to a compositelike structure consisting of (AuCu)6Sn5 grains and finely dispersed, βSn islands.

This paper is a study of the phase equilibria of the Sn-3.8Ag-0.7Cu alloy investigated by a differential cooling method. The difficulty in assessing phase equilibria of the Sn-Ag-Cu (SAC) system because of the insufficient resolution of conventional characterization techniques is solved by inducing preferential growth of a solid phase in a melt by holding the alloy at the solid-liquid phase-equilibrium field. Application of the technique to Sn-3.8Ag-0.7Cu with varying holding temperatures yielded results that the alloy is slightly off eutectic composition. The phase-formation sequence of the alloy during solidification was found to be Ag3Sn, β-Sn, and finally the ternary eutectic microstructure.

This paper presents a study of electron scattering in damascene-processed Cu interconnects. To understand the leading electron-scattering mechanism responsible for the size effect, Cu interconnects with varying physical widths, 80–750 nm, were made, and their resistivity characterized as a function of temperature, ranging from liquid He temperature (4.2 K) to 500 K. The resulting data suggest that surface scattering, contrary to expectations, was not the primary cause of the size effect observed in this investigation. Surface scattering was found to weaken with decreasing line width. Further analysis leads to the conclusion that a substantial fraction of the size effect originates from impurity content scaling inversely with width in these samples.

This paper presents experimental evidence suggesting that electromigration (EM) can be a serious reliability threat when the dimension of Cu interconnects approaches the nanoscale range. To understand the failure mechanism prevailing in nanoscale Cu interconnects, single-level, 400-µm long interconnects with various effective widths, ranging from 750 nm to 80 nm, were made, EM tested, and characterized in this investigation. The results indicate that interface EM (Cu/barrier) may be the predominant EM mechanism in all line widths. The evidence supporting the active Cu/barrier interface EM includes the fact that the EM lifetime is inversely proportional to the interface area fraction. Microscopic analysis of the failure sites also supports the conclusion of interface EM because voids and hillocks are found at the ends of the test strip, which is not possible if lines fail by grain-boundary EM in the test structure used in this study. In addition, our study finds evidence that failure is assisted by a secondary mechanism. The influence of this factor is particularly significant when the feature size is small, resulting in more uniform distribution of failure time in narrower lines. Although limited, evidence suggests that the secondary factor is probably attributed to pre-existing defects or grain boundaries.

This report studies the electromigration performance of W-plug via structures under the reservoir effect. The lifetime improvement factor M was observed to be a weak function of the stressing current and approximately equal to 2. A Simple model is included in the report to explain this observation. The model also predicts the most effective reservoir length for electromigration lifetime improvement.

This paper reports the formation of intermetallic compounds in Au/Ni/Cu/Ti under-bump-metallization (UBM) structure reacted with Ag-Sn eutectic solder. In this study, UBM is prepared by evaporating Au(500 A)/Ni(1000 A)/Cu(7500 A) /Ti (700 A) thin films on top of Si substrates. It is then reacted with Ag-Sn eutectic solder at 260 C for various times to induce different stages of the interfacial reaction. Microstructural examination of the interface, using both chemical and crystallographic analysis, indicates that two types of intermetallic compounds are formed during the interfacial reaction. The first phase, formed at the intial stage of the reaction, is predominantly Ni3Sn4. At longer times the Ni3Sn4 phase transforms into (Cu, Ni)6Sn6, probably induced by interdiffusion of Cu and Ni. At this stage, the underlying Cu layer also reacts with Sn and forms the same phase, (Cu,Ni)6Sn5. As a result, the fully reacted interface is found to consist of two intermetallic layers with the same phase but different morphologies.

Electromigration is a serious potential source of failure in the narrow, thin-film Al-Cu conductors used in modern microelectronic devices. The problem has become more acute as line widths have shrunk to below one micrometer, creating lines with quasi-bamboo microstructures. The usual mechanism of internal electromigration failure in such lines involves the formation of a transgranular void across a bamboo grain at the upstream end of a long, polygranular segment, preceded by the depletion of copper from both the polygranular segment and the upstream bamboo grain. At least three metallurgical mechanisms are available to inhibit this failure mechanism and improve the useful lifetime of the line, Each of these methods has been demonstrated in the laboratory environment.

The work reported here concerns the effect of a brief exposure to a reversed current on the electromigration failure of narrow Al-Cu thin-film conducting lines. While the precise mechanism by which Cu retards electromigration in AlCu alloys is not fully understood, the consistent observation that electromigration failure is preceded by the sweeping of Cu from the failure site can be used to improve electromigration resistance by stabilizing the distribution of Cu. One way of doing this is to expose the Al-Cu line to a reverse current for some period of time. The present work shows that this method is particularly effective in thin lines with “quasi-bamboo” microstructures. It has the effect of building a reservoir of Cu at the upstream ends of the polygranular segments that are the preferred failure sites, and significantly increases both the mean time to failure, and the time to first failure of a distribution of lines. It can be inferred from these results that Al-Cu lines that conduct alternating current should be exceptionally resistant to electromigration failure.

This paper reports the observation of HgTe precipitate formation and its subsequent evolution in a PbTe semiconductor matrix containing 4 mol. % HgTe (PbTe-4HgTe) produced by a controlled precipitation process. The controlled precipitation process is being developed as a new way to produce a large number of quality semiconductor nanocrystals more simply than the conventional methods. Characterization of the HgTe precipitates resulting from application of controlled precipitation to the PbTe-4HgTe alloy system provides evidence that this method is effective in generating nanocrystals. Transmission electron microscopy of the processed alloys reveals that HgTe precipitates are extremely small in size, maintain a coherent interface, and experience a unique shape evolution with aging.

In previous work we proposed a simple constitutive equation that describes the electromigration failure kinetics in naturally passivated Al(Cu) quasi-bamboo lines. The time to failure, tf obeys the relation, tf = t0 exp (−l/t0), where t0 and l0 are characteristic constants and l is the length of the polygranular segment that causes failure (which is ordinarily the longest polygranular segment in the line). The present paper gathers the data supporting this relation, which includes tests on lines as-patterned and annealed at low and high temperature, and examines the dependence of the factors t0 and l0 on current density, test temperature, line geometry, and Al2Cu precipitate distribution. The experimental data suggest that to varies geometrically with j, with exponent n ≈ 2.8, and exponentially with T−1, with activation energy of ∼0.69 eV. It also varies with the line width and the distribution of Al2Cu precipitates. On the other hand, l0 is only weakly dependent on current density and temperature, but may vary with the ratio of line width to grain size (w/G).

This study investigates the effect of solute additions on electromigration in Al-based thin film binary alloys. The “cross-strip” technique was used to observe solute electromigration and its influence on Al electromigration. The results of electromigration tests on five alloy additions, Ag, Au, Cu, Pd and Ni, are presented. It is concluded that beneficial solutes have two characteristics. First, they have a large, negative effective valence (Z**). Second, they have sufficient solubility in Al at test temperature to provide a reservoir of mobile atoms. Ag and Au are relatively ineffective because of their low effective valence. Pd and Ni appears to be relatively ineffective because of their low solubility at test temperature. Only Cu satisfies both criteria.

Thin-film Al-2Cu conducting lines with “quasi-bamboo” microstructures were investigated to understand the microstructural mechanism of electromigration failure. Both conventional test structures and electron-transparent lines fabricated on silicon nitride windows were utilized to identify the “weakest” polygranular segments. Even when the current density was reduced to 0.75 MA/cm2 and the segment length was on the order of a few microns, failure occurs at the upstream termination of the longest polygranular segment in the line, at a time that decreases exponentially with the segment length. There is no apparent “Blech length” in quasi-bamboo Al- Cu lines; the longest segments are the failure sites, and their lifetime decreases with segment length in a regular way, even when the longest segments are only a few microns in length. It follows (and is observed) that the time-to-failure distribution of a group of lines is fixed by the distribution of the longest polygranular segments within them. This distribution can be effectively controlled by post-pattern annealing, which can refine the quasi-bamboo structure so that the longest polygranular segments are short and the distribution of longest polygranular segment lengths is narrow. Consequently, post pattern annealing is a very effective method for improving reliability by increasing the time to first failure.

In order to understand the role of Sc on electromigration (EM) failure, Al interconnects with 0.1 and 0.3 wt.% Sc were tested as a function of post-pattern annealing time. In response to the evolution of the line structure, the statistics of lifetime evolved. While the addition of Sc greatly reduces the rate of evolution of the failure statistics because the grain growth rate decreases, the MTF variation was found to be very similar to that of pure Al. These observations seem to show that Sc has little influence on the kinetics of Al EM; however, it has some influence on the EM resistance of the line since it is an efficient grain refiner. Unlike Cu in Al, Sc does not seem to migrate, which may explain its lack of influence on the kinetics of Al EM.

Al-Cu lines of submicron width ordinarily have quasi-bamboo microstructures that contain both bamboo grains and polygranular segments. The usual mechanism of internal electro-migration failure in such lines involves the formation of a transgranular void across a bamboo grain at the upstream end of a long, polygranular segment. The voiding is preceded by the depletion of Cu from both the polygranular segment and the upstream bamboo grain. At least three metallurgical mechanisms are available to inhibit this failure mechanism and improve the useful lifetime of the line. First, the line can be annealed after patterning to break up long polygranular segments. Second, the line can be aged at relatively low temperature to stabilize the distribution of Cu and retard its depletion from polygranular segments. Third, the line can be subjected to reverse currents to restore the distribution of Cu and provide a Cu reservoir. Each of these methods has been demonstrated in the laboratory environment.

The work reported here concerns the effect of grain structure on electromigration failure in pure Al and Al-2wt.%Cu-lwt.%Si lines. The grain structures of fine lines were controlled by annealing after patterning to promote the formation of "bamboo" structures. Significant improvements in the median time to failure (MTF) and the deviation of the time to failure (DTF) were observed with the development of near-bamboo structures with polygranular-segment lengths shorter than ~ 5 μm. The most common failure sites are voids or slits across bamboo grains at the upstream ends of polygranular segments. The time-to-failure decreases with the polygranular segment length, and can be significantly enhanced by controlling the grain structure.

Microstructural studies of electromigration failure were performed on A1-2Cu-1Si interconnects with 1.3 μm width. The lines were tested to failure under controlled conditions after pre-aging for various times at three different temperatures. Examination of the microstructure of the failure sites suggests that the lines fail at the bamboo grains that terminate the longest polygranular segments in the line. Transgranular slit voids form after Cu has been swept from the grain that fails. Hence, pre-aging lines to create a more stable distribution of Cu lengthens the time required to sweep Cu and significantly increases the time to failure. The optimal microstructure has a maximum intragranular density of stable θ precipitates. In this case transgranular slit failure is suppressed, and the bamboo grain fails by diffuse thinning to rupture.