1. New Directions in Nanotechnology — Imprint Techniques
- Author
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D. Lyebyedyev, Hella-Christin Scheer, and H. Schulz
- Subjects
Replica molding ,Bridging (networking) ,Computer science ,Microcontact printing ,Self ,Nanotechnology - Abstract
Within the last few years a number of new techniques have emerged for definition of nm-scale patterns. They may be summarised under concepts like bottom-up or top-down, addressing the basic direction of pattern assembly. Bottom-up techniques based on the self assembly offer a very high innovation potential. At the other hand, top-down techniques are somewhat nearer to state of the art technology. These latter may be optimally suited for bridging the gap between conventional techniques and the high end self assembly.
- Published
- 2000
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