1. Low temperature thermal annealing-induced α-FeSi2 derived phase in an amorphous Si matrix.
- Author
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Naito, M., Ishimaru, M., Hirotsu, Y., Valdez, J. A., and Sickafus, K. E.
- Subjects
HEAT treatment of metals ,ELECTRON microscopy ,ELECTRON diffraction ,PROPERTIES of matter ,AMORPHOUS substances - Abstract
Thermal annealing-induced recrystallisation in Fe ion-implanted Si was investigated by transmission electron microscopy. Single crystals of Si(111) were implanted with 120 keV Fe ions to a fluence of 1.0×10
17 cm-2 at cryogenic temperature. A buried amorphous Fe-Si layer in an amorphous Si matrix was formed in the as-implanted sample. Nanobeam electron diffraction revealed that metastable α-FeSi2 precipitates embedded in the amorphous Si matrix were formed after annealing at 350 °C for 8 h. The formation of this α-FeSi2 -derived phase was unusual, because it has been observed only in epitaxially grown thin films. Based on the Fe1-x Si (02 in the amorphous matrix. [ABSTRACT FROM AUTHOR] - Published
- 2008
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