6 results on '"Steinert, Steffen"'
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2. The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay.
3. Wafer alignment mark placement accuracy impact on the layer-to-layer overlay performance.
4. Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution.
5. Direct correlation between mask registration and on-wafer measurements for individual logic device features.
6. The mask contribution as part of the intra-field on-product overlay performance.
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