21 results on '"Ito, Shinichi"'
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2. Feasibility studies of coating method for planarization process.
3. Immersion resist process for 32-nm node logic devices.
4. LWR reduction in low-k1 ArF-immersion lithography.
5. Sub-45nm resist process using stacked-mask process.
6. Defectivity reduction studies for ArF immersion lithography.
7. Pattern defect study using cover material film in immersion lithography.
8. Effect of post development process for resist roughness.
9. Influence of the watermark in immersion lithography process.
10. A new process for accurate alignment using laser ablation technology.
11. New frequency stabilization method of a semiconductor laser using the Faraday effect of the Rb absorption line.
12. Novel development technique using ozonated water.
13. Novel laser ablation patterning with organic film in running water.
14. Novel baking technology using halogen lamps for higher-precision photomask fabrication.
15. Dissolution performance of device pattern with low-impact development.
16. High-accuracy development monitoring technology.
17. Subquarter-micron lithography with dual-trench-type alternating PSM.
18. Development of an advanced mask and its fabrication system.
19. Lithographic performance of SiNx single-layer halftone mask.
20. Optimization of optical properties for single-layer halftone masks.
21. New KrF excimer laser process for improving novolac-type photoresist resolution.
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