11 results on '"Steinert, Steffen"'
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2. Direct correlation between mask registration and on-wafer measurements for individual logic device features
3. New registration calibration strategies for MBMW tools by PROVE measurements
4. The mask contribution as part of the intra-field on-product overlay performance
5. Wafer alignment mark placement accuracy impact on the layer-to-layer overlay performance
6. The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay
7. Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
8. Off-line mask-to-mask registration characterization as enabler for computational overlay
9. Registration performance on EUV masks using high-resolution registration metrology
10. Co-optimization of RegC and TWINSCAN corrections to improve the intra-field on-product overlay performance
11. On the benefit of high resolution and low aberrations for in-die mask registration metrology
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