1. Novel 0.2-μm i-line lithography using phase-shifting on the substrate
- Author
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Keichiro Uda, Makoto Tanigawa, Keizo Sakiyama, Takayuki Taniguchi, Hiroyuki Moriwaki, and Hiroki Tabuchi
- Subjects
Optics ,Fabrication ,Materials science ,Resist ,business.industry ,Resolution (electron density) ,Phase (waves) ,X-ray lithography ,Substrate (printing) ,Stepper ,business ,Lithography - Abstract
This paper describes a novel i-line lithography by phase-shifting on the substrate (POST). With POST, 0.2?m resist patterns have been achieved by using an i-line stepper and conventional masks without phase shifters. It was confirmed that fine patterns were formed by the phase-shifting effect in the resist on the substrate. Simulation suggests that POST has a better resolution than a phase-shifting mask. This method consists of simple processes and is expected to be useful in the fabrication of deep-submicron patterns for ULSI.
- Published
- 1992
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