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3. Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry

Author

Dorney, Kevin, primary, Kissoon, Nicola N., additional, Holzmeier, Fabian, additional, Larsen, Esben W., additional, Singh, Dhirendra P., additional, Arvind, Shikhar, additional, Santra, Sayantani, additional, Fallica, Roberto, additional, Makhotkin, Igor, additional, Philipsen, Vicky, additional, De Gendt, Stefan, additional, Fleischmann, Claudia, additional, van der Heide, Paul A. W., additional, and Petersen, John S., additional

Published
2023
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5. Determining the transmission of thin foil filters for soft X-ray free-electron laser radiation: an ablation imprint approach (Conference Presentation)

Author

Burian, Tomáš, primary, Hájková, Vera, additional, Juha, Libor, additional, Saksl, Karel, additional, Vozda, Vojtech, additional, Makhotkin, Igor A., additional, Louis, Eric, additional, Schreiber, Siegfried, additional, Tiedtke, Kai, additional, Toleikis, Sven, additional, Keitel, Barbara, additional, Plönjes, Elke, additional, Ruiz-Lopez, Mabel, additional, Kuhlmann, Marion, additional, Wodzinski, Thomas A., additional, Enkisch, Hartmut, additional, Hermann, Martin, additional, Strobel, Sebastian, additional, Loch, Rolf A., additional, Sobierajski, Ryszard, additional, Jacyna, Iwanna, additional, Klinger, Dorota, additional, Jurek, Marek, additional, Pelka, Jerzy, additional, de Vries, Gosse, additional, Störmer, Michael, additional, Scholze, Frank, additional, Siewert, Frank, additional, Mey, Tobias, additional, and Chalupský, Jaromír, additional

Published
2019
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6. Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Author

Makhotkin, Igor Alexandrovich, Zoethout, E., Louis, Eric, Yakunin, S.N., Muellender, S., Bijkerk, Frederik, Naulleau, Patrick P., Wood II, Obert R., Laser Physics & Nonlinear Optics, and XUV Optics

Subjects
Materials science, business.industry, Extreme ultraviolet lithography, Spectral properties, chemistry.chemical_element, Reflectivity, Wavelength, Chemical state, Optics, Optical coating, chemistry, Optoelectronics, business, Boron, Lithography, IR-81732, PhysicsIndustriele produktie en technologie
Abstract

The spectral properties of LaN/B and LaN/B4C multilayer mirrors have been investigated in the 6.5-6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal single mirror reflectance for boron based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN/B4C multilayer system is confirmed experimentally. Calculations of the wavelengthintegrated reflectance for ideal 10-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.

Published
2012

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