15 results on '"Li, Jianliang"'
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2. Creating nonideality: enabling cross-platform process matching solutions with MPC (and a lot of hard work)
3. Multi-layer VEB modeling: capturing interlayer etch process effects for multi-patterning process
4. Binary modeling method to check the sub-resolution assist features (SRAFs) printability
5. Multi-layer model vs. single-layer model for N and P doped poly layers in etch bias modeling
6. Stepwise fitting methodology for optical proximity correction modeling
7. Resist development modeling for OPC accuracy improvement
8. Process variation aware OPC modeling for leading edge technology nodes
9. Three dimensional mask effects in OPC process model development from first principles simulation
10. Resist bias measured in Iso-focal structure
11. 32nm half pitch node OPC process model development for three dimensional mask effects using rigorous simulation
12. Rapid search of the optimum placement of assist feature to improve the aerial image gradient in iso-line structure
13. Improvement of model kernel in process simulation by taking pattern correlation into account
14. Extension of 193 nm dry lithography to 45-nm half-pitch node: double exposure and double processing technique
15. IR terahertz-bandwidth InGaAs MSM photodiode for communications and sensing applications
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