27 results on '"Hibbs, Michael"'
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2. Repairing native defects on EUV mask blanks
3. Your worst nightmare: inspection of aggressive OPC on 14nm masks with emphasis on defect sensitivity and wafer defect print predictability
4. Evaluation of the accuracy of complex illuminator designs
5. Understanding the trade-offs of thinner binary mask absorbers
6. Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
7. Intensive optimization of masks and sources for 22nm lithography
8. Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication
9. Massively-parallel FDTD simulations to address mask electromagnetic effects in hyper-NA immersion lithography
10. Characterizing photomask etch processes by phase component analysis (PCA)
11. Imaging behavior of high-transmission attenuating phase-shift mask films
12. Wavelength dependent mask defects
13. The effect of mask substrate and mask process steps on patterned photomask flatness
14. Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes
15. Scaling rules of phase error control for the manufacturing of alternating phase-shifting masks for 193-nm photolithography and beyond
16. Through-pitch correction of scattering effects in 193-nm alternating phase-shift masks
17. Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications
18. Optimum mask and source patterns to print a given shape
19. Evaluation of molybdenum silicide for use as a 193-nm phase-shifting absorber in photomask manufacturing
20. Direct interferometric phase measurement using an aerial image measurement system
21. DUV printability of laser repairs on binary and attenuated phase-shift masks
22. All-dry resist processes for 193-nm lithography
23. 193-nm full-field step-and-scan prototype at MIT Lincoln Laboratory
24. Quantitative stepper metrology using the focus monitor test mask
25. Deep-UV diagnostics using continuous tone photoresist
26. Deep-UV photolithography linewidth variation from reflective substrates
27. Use Of Carbonized Photoresist For Optical Mask Repair
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