13 results on '"Brink, Martin"'
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2. Holistic lithography in the age of the Artificial Intelligence of Things
3. Holistic lithography and metrology's importance in driving patterning fidelity
4. Step-and-scan and step-and-repeat: a technology comparison
5. Wide-field deep-UV wafer stepper for 0.35-μm production
6. Matching of multiple-wafer steppers for 0.35-μm lithography using advanced optimization schemes
7. Evaluation of high-numerical-aperture wide-field steppers for 0.35-micron design rules
8. Overlay and field-by-field leveling in wafer steppers using an advanced metrology system
9. New 0.54 aperture i-line wafer stepper with field-by-field leveling combined with global alignment
10. Automatic on-line wafer stepper calibration system
11. Deep-UV wafer stepper with through-the-lens wafer to reticle alignment
12. Resolution And Overlay Of Submicron I-Line Wafer Steppers
13. Progress in I-line Stepper Technology for Half-Micron
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