48 results on '"Bodermann, Bernd"'
Search Results
2. Simulating achromatic plasmonic lenses with inverted design for improved nano-optics
3. Optical measurements and numerical simulations of the Mueller matrix at silicon nanowire structures
4. Rigorous modeling of a confocal microscope
5. Reconstructing phase aberrations for high-precision dimensional microscopy
6. Ellipsometric characterizations of individual nanoform structures
7. Demonstrating a model-based edge detection and the impact of the illumination pupil’s discretization in optical microscopy
8. Optical nanoform characterization by imaging Mueller matrix ellipsometry
9. Characterization of the optical aberrations of a metrological UV microscope
10. Applicability simulations of inverted plasmonic lenses
11. Welcome and Introduction to SPIE Conference 11783
12. Advanced methods for optical nanometrology (Conference Presentation)
13. Method for non-invasive hemoglobin oxygen saturation measurement using broadband light source and color filters
14. An improved method to derive best-fit parameters and their uncertainties from depolarizing Mueller-matrices (Conference Presentation)
15. Systematic approach on illustrating the challenges represented by optical bidirectional measurements using rigorous simulations
16. Mueller matrix ellipsometry for enhanced optical form metrology of sub-lambda structures
17. Determination of structural deviations in wire grid polarizers for DUV application wavelengths by transmission spectroscopy in the visible spectral range
18. Quantifying parameter uncertainties in optical scatterometry using Bayesian inversion
19. Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing
20. The statistical inverse problem of scatterometry: Bayesian inference and the effect of different priors
21. Development of a scatterometry reference standard
22. The effect of line roughness on DUV scatterometry
23. Alternative methods for uncertainty evaluation in EUV scatterometry
24. The road towards accurate optical width measurements at the industrial level
25. Fast simulation method for parameter reconstruction in optical metrology
26. First steps towards a scatterometry reference standard
27. First steps towards traceability in scatterometry
28. A 193nm microscope for CD metrology for the 32nm node and beyond
29. EUV and DUV scatterometry for CD and edge profile metrology on EUV masks
30. Comparative scatterometric CD measurements on a MoSi photo mask using different metrology tools
31. Optical metrology of micro- and nanostructures at PTB: status and future developments
32. Versatile DUV scatterometer of the PTB and FEM based analysis for mask metrology
33. Comparison of rigorous modelling of different structure profiles on photomasks for quantitative linewidth measurements by means of UV- or DUV-optical microscopy
34. Numerical analysis of DUV scatterometry on EUV masks
35. Aspects and new developments on edge angle and edge profile metrology at PTB
36. Metrology capabilities and performance of the new DUV scatterometer of the PTB
37. Theoretical modelling and experimental verification of the influence of Cr edge profiles on microscopic-optical edge signals for COG masks
38. Investigation and evaluation of scatterometric CD metrology methods
39. Comparison of different approaches for modelling microscope images on the basis of rigorous diffraction calculation
40. Gated heterodyne coherent anti-Stokes Raman scattering for high-contrast vibrational imaging
41. Improved optical linewidth measurement by means of alternating dark field illumination and model-based evaluation
42. Characterization of new CD photomask standards
43. Improved second-harmonic two-wavelength interferometer with refractive index correction without effect modulation
44. Comparative linewidth measurements on chrome and MoSi structures using newly developed microscopy methods
45. New methods for CD measurements on photomasks using dark field optical microscopy
46. Alternating grazing incidence dark-field scanning optical microscopy for dimensional measurements
47. Advantages of optoelectronic frequency control of laser diodes
48. Measuring and modelling the appearance of coated steel surfaces
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