1. A study of properties of ZrO2 thin films deposited by magnetron sputtering under different plasma parameters: Biomedical application.
- Author
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Zegtouf, Hind, Saoula, Nadia, Azibi, Mourad, Bait, Larbi, Madaoui, Noureddine, Khelladi, Mohamed Redha, and Kechouane, Mohamed
- Subjects
MAGNETRON sputtering ,THIN films ,ZIRCONIUM oxide ,X-ray diffraction ,ATOMIC force microscopy ,STAINLESS steel - Abstract
ZrO
2 thin films were deposited on 316L stainless steel substrate by a radio-frequency magnetron sputtering system. The substrate bias voltage, the working gas rate and the reactive gas fraction in the gas mixture were varied. These variations produce a variation in the deferent properties of the obtained films. The deposited films were characterized by X-Rays Diffraction, Atomic Force Microscopy, nano-indentation and potentiodynamic polarization. The experimental results show that the film thickness and the roughness of the films are highly influenced by the plasma parameters. XRD results show that the monoclinic phase is predominant in unbiased deposited films. The best anti-corrosion performance and hardness were obtained for ZrO2 deposited with a substrate bias voltage of −75 V, Ar rate of 6 sccm and oxygen fraction of 25%. [ABSTRACT FROM AUTHOR]- Published
- 2019
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