1. Engineering Nanowire n-MOSFETs at L-g < 8 nm
- Author
-
Mehrotra, Saumitra, Kim, SungGeun, Kubis, Tillmann, Povolotskyi, Michael, Lundstrom, Mark S., and Klimeck, Gerhard
- Subjects
InAs ,nanowire ,quantum transport ,Si ,source-drain tunneling ,strain ,tight-binding (TB) approach ,ELECTRONICS ,FETS ,Nanoscience and Nanotechnology - Abstract
As metal-oxide-semiconductor field-effect transistors (MOSFETs) channel lengths (L-g) are scaled to lengths shorter than L-g < 8 nm source-drain tunneling starts to become a major performance limiting factor. In this scenario, a heavier transport mass can be used to limit source-drain (S-D) tunneling. Taking InAs and Si as examples, it is shown that different heavier transport masses can be engineered using strain and crystal-orientation engineering. Full-band extended device atomistic quantum transport simulations are performed for nanowire MOSFETs at L-g < 8 nm in both ballistic and incoherent scattering regimes. In conclusion, a heavier transport mass can indeed be advantageous in improving ON-state currents in ultrascaled nanowire MOSFETs.
- Published
- 2013