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7. How to Avoid Artifacts in Nanobeam Diffraction Strain Measurements

8. Advances in Elemental Electron Tomography for the State-of-the-art Semiconductor Devices and Circuits Characterization and Failure Analysis

9. Characterization of VLSI Processing Defects Using STEM-EELS Tomography

11. Environmental Optimization for Sub-0.2NM Scanning Transmission Electron Microscopy

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