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1. Fourier spectrum method to determine dose-to-clear in a photoresist.

Author

Sun L, Wood O, Clifford C, Raghunathan S, Kritsun O, Lee M, Kim RH, Mangat P, Koh HP, and Levinson H

Abstract

A Fourier spectrum method to determine the dose-to-clear in a photoresist is proposed. The frequency content of scanning electron microscope resist images is used to determine whether the resist has been dissolved. Using this method, the dose to clear the resist is calculated automatically instead of via visual inspection, a method in which operator influence can affect the result.

Published
2014
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