Search

The study of all-group-IV SiGeSn lasers has opened a new avenue to Si-based light sources. SiGeSn heterostructure and quantum well lasers have been successfully demonstrated in the past few years. It has been reported that, for multiple quantum well lasers, the optical confinement factor plays an important role in the net modal gain. In previous studies, adding a cap layer was proposed to increase the optical mode overlap with the active region and thereby improve the optical confinement factor of Fabry–Perot cavity lasers. In this work, SiGeSn/GeSn multiple quantum well (4-well) devices with various cap layer thicknesses, i.e., 0 (no cap), 190, 250, and 290 nm, are grown using a chemical vapor deposition reactor and characterized via optical pumping. While no-cap and thinner-cap devices only show spontaneous emission, the two thicker-cap devices exhibit lasing up to 77 K, with an emission peak at 2440 nm and a threshold of 214 kW/cm2 (250 nm cap device). The clear trend in device performance disclosed in this work provides guidance in device design for electrically injected SiGeSn quantum well lasers.

We propose a lattice-matched Ge/GeSiSn quantum cascade detector (QCD) capable of operating in the longwave infrared. The optical absorption and carrier transport based on intersubband transitions all occur within the L-valley of the conduction band of the group-IV material system using N-doped quantum wells (QWs). The waveguided lattice matched structure can be deposited strain free on top of a Ge buffer grown on Si substrate, and is end-coupled to low-loss on-chip Ge waveguides. We optimized the QCD structure through the analysis of the photoresponsivity and detectivity D*. The QCD operates in photovoltaic mode with narrow spectral response that is peaked anywhere in the 9 to 16 µm range, tunable by design. This work aims to push the optical response of the photodetectors made from the SiGeSn material system to longer wavelengths. The study suggests the QCD response can indeed significantly extend the spectral range beyond that of the photodiodes and photoconductors made from the same group-IV system for a wide variety of applications in imaging, sensing, lidar, and space-and-fiber communications.

We demonstrate room-temperature, mid-infrared resonant electroluminescence from GeSn resonant-cavity LEDs with a lateral p-i-n configuration on a silicon-on-insulator substrate. A vertical cavity to enhance light emission in the GeSn active layer is formed by the low-index buried oxide and deposited SiO 2 layer. A planar lateral p-i-n diode structure favorable for CMOS-compatible, dense integration was designed and fabricated for current injection. Under continuous-wave electrical injection, room-temperature resonant electroluminescence was successfully observed at ∼ 1980 nm with a spectral emission factor of 2.2. These results could pave the way toward efficient electrically injected GeSn light emitters operating at room temperature.

We report on lateral p-i-n GeSn waveguide photodetector on silicon substrates for complementary metal-oxide-semiconductor (CMOS)-compatible mid-infrared silicon photonics.

GeSn lasers enable the monolithic integration of lasers on the Si platform using all-group-IV direct-bandgap material. The GeSn laser study recently moved from optical pumping into electrical injection. In this work, we present explorative investigations of GeSn heterostructure laser diodes with various layer thicknesses and material compositions. Cap layer material was studied by using Si 0.03 Ge 0.89 Sn 0.08 and Ge 0.95 Sn 0.05 , and cap layer total thickness was also compared. The 190 nm SiGeSn-cap device had threshold of 0.6 kA / cm 2 at 10 K and a maximum operating temperature ( T max ) of 100 K, compared to 1.4 kA / cm 2 and 50 K from 150 nm SiGeSn-cap device, respectively. Furthermore, the 220 nm GeSn-cap device had 10 K threshold at 2.4 kA / cm 2 and T max at 90 K, i.e., higher threshold and lower maximal operation temperature compared to the SiGeSn cap layer, indicating that enhanced electron confinement using SiGeSn can reduce the threshold considerably. The study of the active region material showed that device gain region using Ge 0.87 Sn 0.13 had a higher threshold and lower T max , compared to Ge 0.89 Sn 0.11 . The performance was affected by the metal absorption, free carrier absorption, and possibly defect density level. The maximum peak wavelength was measured as 2682 nm at 90 K by using Ge 0.87 Sn 0.13 in gain regions. The investigations provide directions to the future GeSn laser diode designs toward the full integration of group-IV photonics on a Si platform.

Temperature-dependent characteristics of GeSn/Ge multiple-quantum-well (MQW) photoconductors (PCs) on silicon substrate were investigated. The high quality GeSn/Ge MQW epitaxial structure was grown on a silicon substrate using low temperature molecular beam epitaxy techniques with atomically precise thickness control. Surface-illuminated GeSn/Ge MQW PCs were fabricated using complementary metal-oxide-semiconductor-compatible processing and characterized in a wide temperature range of 55–320 K. The photodetection range was extended to λ = 2235 n m at T = 320 K due to bandgap shrinkage with Sn alloying. Measured spectral responsivity was enhanced at reduced temperatures. These results provide better understanding of GeSn/Ge MQW structures for efficient short-wave infrared photodetection.

The 2 µm wavelength band has recently gained increased attention for potential applications in next-generation optical communication. However, it is still challenging to achieve effective photodetection in the 2 µm wavelength band using group-IV-based semiconductors. Here we present an investigation of GeSn resonant-cavity-enhanced photodetectors (RCEPDs) on silicon-on-insulator substrates for efficient photodetection in the 2 µm wavelength band. Narrow-bandgap GeSn alloys are used as the active layer to extend the photodetection range to cover the 2 µm wavelength band, and the optical responsivity is significantly enhanced by the resonant cavity effect as compared to a reference GeSn photodetector. Temperature-dependent experiments demonstrate that the GeSn RCEPDs can have a wider photodetection range and higher responsivity in the 2 µm wavelength band at higher temperatures because of the bandgap shrinkage. These results suggest that our GeSn RCEPDs are promising for complementary metal-oxide-semiconductor-compatible, efficient, uncooled optical receivers in the 2 µm wavelength band for a wide range of applications.

We demonstrate silicon-based p - n - p floating-base GeSn heterojunction phototransistors with enhanced optical responsivity for efficient short-wave infrared (SWIR) photodetection. The narrow-bandgap GeSn active layer sandwiched between the p - G e collector and n - G e base effectively extends the photodetection range in the SWIR range, and the internal gain amplifies the optical response by a factor of more than three at a low driving voltage of 0.4 V compared to that of a reference GeSn p - i - n photodetector (PD). We anticipate that our findings will be leveraged to realize complementary metal-oxide-semiconductor-compatible, sensitive, low driving voltage SWIR PDs in a wide range of applications.

Optical detection at 2-μm wavelength spectral range has recently attracted increasing attention for many important applications. This can be done using narrow-bandgap III-V or II-VI based semiconductor photodetectors (PDs). Here, we report on group-IV based GeSn/Ge multiple-quantum-well (MQW) photoconductive photodetectors (PDs) for optical detection at the 2μm wavelength band. By introducing Sn into the well, the direct bandgap is reduced, thereby extending the absorption edge into longer wavelengths. The optical responsivity measurements reveal that the detection of the fabricated PDs is extended beyond 2000 nm. These results demonstrate the feasibility of GeSn/Ge MQW PDs for optical detection at the 2μm wavelength band.