1. Performance and operation of stressed dual gap RF MEMS varactors
- Author
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Greg McFeetors and Michal Okoniewski
- Subjects
electromechanical systems (MEMS) ,varactor ,capacitors ,Q factor ,Telecommunication ,TK5101-6720 ,Information technology ,T58.5-58.64 - Abstract
The design, fabrication and measurement of a continuously tunable RF MEMS capacitor is described. The capacitor’s dual gap height architecture allows for electrostatic tuning with low resistive loss and a large tuning range. A new dual tuning scheme is introduced for use with two voltage sources. This dual tuning, coupled with a stress-induced bridge, is used to reach further device tuning. Measurements indicate a continuously tunable capacitance range of 6.2:1 with a quality factor over 50 at 30 GHz for 310 fF.
- Published
- 2023
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