1. Colloidal Lithography for Photovoltaics: An Attractive Route for Light Management
- Author
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Rui D. Oliveira, Ana Mouquinho, Pedro Centeno, Miguel Alexandre, Sirazul Haque, Rodrigo Martins, Elvira Fortunato, Hugo Águas, and Manuel J. Mendes
- Subjects
colloidal lithography ,thin-film photovoltaics ,photonics ,light-trapping ,self-cleaning ,Chemistry ,QD1-999 - Abstract
The pursuit of ever-more efficient, reliable, and affordable solar cells has pushed the development of nano/micro-technological solutions capable of boosting photovoltaic (PV) performance without significantly increasing costs. One of the most relevant solutions is based on light management via photonic wavelength-sized structures, as these enable pronounced efficiency improvements by reducing reflection and by trapping the light inside the devices. Furthermore, optimized microstructured coatings allow self-cleaning functionality via effective water repulsion, which reduces the accumulation of dust and particles that cause shading. Nevertheless, when it comes to market deployment, nano/micro-patterning strategies can only find application in the PV industry if their integration does not require high additional costs or delays in high-throughput solar cell manufacturing. As such, colloidal lithography (CL) is considered the preferential structuring method for PV, as it is an inexpensive and highly scalable soft-patterning technique allowing nanoscopic precision over indefinitely large areas. Tuning specific parameters, such as the size of colloids, shape, monodispersity, and final arrangement, CL enables the production of various templates/masks for different purposes and applications. This review intends to compile several recent high-profile works on this subject and how they can influence the future of solar electricity.
- Published
- 2021
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