1. Demonstration of Steep Switching Behavior Based on Band Modulation in WSe 2 Feedback Field-Effect Transistor.
- Author
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Kim, Seung-Mo, Jun, Jae Hyeon, Lee, Junho, Taqi, Muhammad, Shin, Hoseong, Lee, Sungwon, Lee, Haewon, Yoo, Won Jong, and Lee, Byoung Hun
- Subjects
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FIELD-effect transistors , *OXYGEN plasmas , *EPITAXY , *DIELECTRICS , *SILICON - Abstract
Feedback field-effect transistors (FBFETs) have been studied to obtain near-zero subthreshold swings at 300 K with a high on/off current ratio ~1010. However, their structural complexity, such as an epitaxy process after an etch process for a Si channel with a thickness of several nanometers, has limited broader research. We demonstrated a FBFET using in-plane WSe2 p−n homojunction. The WSe2 FBFET exhibited a minimum subthreshold swing of 153 mV/dec with 30 nm gate dielectric. Our modeling-based projection indicates that the swing of this device can be reduced to 14 mV/dec with 1 nm EOT. Also, the gain of the inverter using the WSe2 FBFET can be improved by up to 1.53 times compared to a silicon CMOS inverter, and power consumption can be reduced by up to 11.9%. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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