1. Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser
- Author
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Ján Lančok, Libor Juha, Milan Tichý, A. Kolpaková, Pavel Kudrna, J. Wild, Tomáš Burian, L. Vysin, Peter Pira, Z. Zelinger, Pavel Kubát, Stanislav Daniš, and Svatopluk Civiš
- Subjects
Electron density ,Materials science ,Acoustics and Ultrasonics ,Analytical chemistry ,chemistry.chemical_element ,Plasma ,Substrate (electronics) ,Condensed Matter Physics ,Laser ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Bismuth ,law.invention ,symbols.namesake ,chemistry ,law ,Extreme ultraviolet ,symbols ,Electron temperature ,Langmuir probe - Abstract
Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1–3 eV and ∼1013–1014 m−3, respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target.
- Published
- 2014