1. Demonstration of an erbium-doped microsphere laser on a silicon chip
- Author
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Shiyue Hua, Min Xiao, Xiaoshun Jiang, and Huibo Fan
- Subjects
Materials science ,Physics and Astronomy (miscellaneous) ,business.industry ,Doping ,technology, industry, and agriculture ,chemistry.chemical_element ,Laser ,law.invention ,Microsphere ,Erbium ,chemistry ,law ,Silica microsphere ,Silicon chip ,Optoelectronics ,business ,Instrumentation ,Lasing threshold ,Erbium ions - Abstract
We demonstrate a low-threshold microsphere laser on a silicon chip, fabricated from erbium-doped silica sol–gel film. Single-longitudinal mode lasing emission is observed from a 37 μm diameter microsphere cavity with an erbium ion concentration of 2 × 1019 cm−3. The measured lasing threshold of the silica microsphere laser is as low as 4.8 μW.
- Published
- 2013
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