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Ohmic contacts are formed on the epitaxial n-GaN film by the electron beam evaporation of Ti/Al and their rapid thermal alloying with device separation by a fairly fast Electron Cyclotron Resonance (ECR) plasma etching. The etched surface has a poor ohmic contact with a typical contact resistance of 8.1 × 10 - 3 Ω.cm 2 , while the as-received and rinsed surface has a better contact with a lower contact resistance of 7.5 × 10 - 6 Ω.cm 2 . The resistivity of the film is determined as a function of the temperature, in good agreement with the numerical analyses. The ohmic characteristics are evaluated by the 1/f noise measurements. Low ohmic contacts give the typical 1/f noise characteristics which increase with the square of the sample current 1, while higher ohmic contacts give a linear noise power dependence on the sample current 1. We are able to evaluate, therefore, the ohmicity of the electrodes most sensitively from the 1/f noise measurements. Assuming the relevant total electron number between the electrodes, the Hooge parameter is estimated as α H = 5.3 x 10 - 6 at room temperature, in qualitative agreement with the cross correlational 1/f noise model.