1. Evaluation of Al/Ti/n-GaN Contacts by Current Noise Measurements
- Author
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Josef Sikula, Toshiaki Matsui, Munecazu Tacano, Hirokazu Tanizaki, Sumihisa Hashiguchi, Saburo Yokokura, and Nobuhisa Tanuma
- Subjects
Noise power ,Materials science ,Plasma etching ,Physics and Astronomy (miscellaneous) ,Condensed matter physics ,Contact resistance ,General Engineering ,Analytical chemistry ,General Physics and Astronomy ,Electron beam physical vapor deposition ,Noise (electronics) ,Electron cyclotron resonance ,Electrical resistivity and conductivity ,Ohmic contact - Abstract
Ohmic contacts are formed on the epitaxial n-GaN film by the electron beam evaporation of Ti/Al and their rapid thermal alloying with device separation by a fairly fast Electron Cyclotron Resonance (ECR) plasma etching. The etched surface has a poor ohmic contact with a typical contact resistance of 8.1 × 10 - 3 Ω.cm 2 , while the as-received and rinsed surface has a better contact with a lower contact resistance of 7.5 × 10 - 6 Ω.cm 2 . The resistivity of the film is determined as a function of the temperature, in good agreement with the numerical analyses. The ohmic characteristics are evaluated by the 1/f noise measurements. Low ohmic contacts give the typical 1/f noise characteristics which increase with the square of the sample current 1, while higher ohmic contacts give a linear noise power dependence on the sample current 1. We are able to evaluate, therefore, the ohmicity of the electrodes most sensitively from the 1/f noise measurements. Assuming the relevant total electron number between the electrodes, the Hooge parameter is estimated as α H = 5.3 x 10 - 6 at room temperature, in qualitative agreement with the cross correlational 1/f noise model.
- Published
- 2003
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