8 results on '"Itokawa, Hiroshi"'
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2. Contribution of Carbon to Growth of Boron-Containing Cluster in Heavily Boron-Doped Silicon
3. Carbon Incorporation into Substitutional Silicon Site by Molecular Carbon Ion Implantation and Recrystallization Annealing as Stress Technique in n-Metal–Oxide–Semiconductor Field-Effect Transistor
4. Influence of Carbon in In-situ Carbon-Doped SiGe Films on Si(001) Substrates on Epitaxial Growth Characteristics
5. Contribution of Carbon to Activation and Diffusion of Boron in Silicon
6. Reduction in pn Junction Leakage for Ni-Silicided Small Si Islands by Using Improved Convection Annealing
7. In situDoped Embedded-SiGe Source/Drain Technique for 32 nm Node p-Channel Metal–Oxide–Semiconductor Field-Effect Transistor
8. In situ Doped Embedded-SiGe Source/Drain Technique for 32 nm Node p-Channel Metal–Oxide–Semiconductor Field-Effect Transistor.
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