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We present an experimental study of plasma enhanced chemical vapor deposition (PECVD) of SiO2 films from tetraethoxysilane (TEOS) using a plasma jet based on capillary dielectric barrier discharge (CDBD) at atmospheric pressure. We tried three different configurations: (a) coaxial type, (b) a crossed type with a vertical plasma jet and a tilted TEOS supply, and (c) another crossed type with the reversed arrangement. The deposition rate of SiO2 films increased with the driving frequency of the plasma jet in all configurations, and as the best record it reached up to 280 nm/s at a frequency of 15 kHz in the configuration (c) with the aid of O3 supply, which was three times as fast as that measured in the configuration (a) without O3 supply. [ABSTRACT FROM AUTHOR]

The behavior of N2+ ions in a low-frequency driven atmospheric pressure He plasma jet effused into ambient air was analyzed from laser induced fluorescence (LIF) spectroscopy measurements. The gas temperature derived from the rotational distribution was kept near room temperature and the drift velocity of N2+ ions estimated from the line shape was almost zero as compared to the apparent speed of the plasma bunch given by the spatiotemporal intensity profile. This shows that the mechanism of moving plasma bunches can be attributed to the ionization wave propagation similar to the streamer in positive corona discharge. [ABSTRACT FROM AUTHOR]