1. High-Power 650-nm-Band AlGaInP Visible Laser Diodes Fabricated by Reactive Ion Beam Etching Using Cl2/N2Mixture
- Author
-
Hideto Adachi, Akira Takamori, Masaya Mannoh, Toshiya Fukuhisa, Isao Kidoguchi, and Kiyotake Tanaka
- Subjects
Fabrication ,Chemistry ,business.industry ,General Engineering ,General Physics and Astronomy ,Laser ,Electron cyclotron resonance ,Semiconductor laser theory ,law.invention ,Optics ,law ,Degradation (geology) ,Dry etching ,Reactive-ion etching ,business ,Diode - Abstract
High-power 650-nm-band AlGaInP visible laser diodes having stable fundamental-transverse-mode at high temperatures were produced using electron cyclotron resonance reactive ion beam etching (ECR-RIBE). Epilayers were etched using a Cl2/N2mixture gas, resulting in very smooth surfaces and symmetric laser mesas. Lasers that are 700-µm-long and 6%/80% coated were fabricated. The typical threshold current of these devices was as low as 46 mA at room temperature, and a stable fundamental-mode operation over 30 mW is obtained up to 70°C. The lasers operated for over 1000 h at 60°C under an output power of 25 mW, and their degradation rate was as low as lasers fabricated by the ordinary wet etching process.
- Published
- 1997
- Full Text
- View/download PDF