1. Sputter Deposition of ${\rm MoSi}_{2}$ Film as a Barrier for Nb-Based Josephson Junction
- Author
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Yonuk Chong, Se Il Park, and Kyu Tae Kim
- Subjects
Josephson effect ,Materials science ,business.industry ,Niobium ,chemistry.chemical_element ,Sputter deposition ,Condensed Matter Physics ,Electronic, Optical and Magnetic Materials ,chemistry.chemical_compound ,chemistry ,Sputtering ,Silicide ,Deposition (phase transition) ,Optoelectronics ,Electrical and Electronic Engineering ,Thin film ,business ,Sheet resistance - Abstract
Recently, sputter-deposited MoSi2 films have been successfully used as a barrier material in Nb/MoSi2/Nb Josephson junctions. In this report, we present our study on the deposition conditions of MoSi2 film for electronics application. We investigated the film stress and sheet resistance as a function of deposition conditions. We also studied the micro-structural change in the film according to the deposition conditions using electron microscopes. We suggest that the thermal strain need to be considered in order to get a reliable junction.
- Published
- 2009
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