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Surface plasmon resonance mediated by Gold (Au) nanoparticles (NPs) was employed to enhance the ultraviolet (UV) response of p-Si/n-ZnO nanorod (NR) heterojunction photodetectors (HPDs). In the ZnO NRs with Au NP covering, the photoluminescence spectrum shows that the band-to-band emission of ZnO (384 nm) is increased by a magnitude of 3, and the deep-level emissions (450-700 nm) are drastically decreased as compared with HPDs without coverings of Au NPs. Such a result increases UV-to-visible rejection ratio from 214 to 6180 and it attributes that the defect-level emissions of ZnO induce surface plasmon resonance in Au NPs and then enhances the emissions, exciting a large quantity of electrons crossing over the Au NP/ZnO interface barrier. Consequently, these electrons are transferred to the ZnO conduction band from the Au NPs, causing a photocurrent gain and the quantum efficiency is as high as 1157% at 2 V reverse bias.

ZnO and Y-doped ZnO nanocrystalline films were separately fabricated on the glass substrates by sol-gel spin-coating method. X-ray diffraction patterns of the films show the same wurtzite hexagonal structure and (0 0 2) preferential orientation. Scanning electron microscope images show that grain size and thickness of the nanocrystalline films decrease with increasing doping concentration. The decrease of optical bandgap with the increase of Y doping is deduced from the transmittance spectra. Temperature-dependent resistivity reveals a semiconductor transport behavior for all ZnO and Y-doped ZnO nanocrystalline films. The resulting conductivity originates from the combination of thermal activation conduction and Mott variable-range hopping (VRH) conduction. In the high-temperature range, the temperature-dependent resistivity can be described by the Arrhenius equation, ${\sigma}$ $(T)$ = ${\sigma}_{0}$ exp[ $-(E_{a}$ /kT)], which shows the thermal activation conduction. The activation energy $E_{a}$ increases from 0.47 meV for ZnO film to 0.83 meV for Zn $_{0.98}$ Y $_{0.02}$ O film. On the contrary, in the low-temperature range, the temperature-dependent resistivity can be fitted well by the relationship, ${\sigma}$ ( $T)$ = ${\sigma}_{h}$ $_{0}$ exp[ $-(T_{0}$ / $T)$ $^{1/4}$ ], which indicates the behavior of Mott VRH. The results demonstrate that the crystallization and the corresponding carrier transport behavior of the ZnO and Y-doped ZnO nanocrystalline films are affected by Y doping.

The Bi0.85 Eu0.15 FeO3 /Bi3.2 Y0.8 Ti3 O12 bilayer thin films were prepared on Pt(111)/Ti/SiO 2/Si(100) substrates using the sol-gel process and annealed by rapid thermal annealing in various annealing environments (ambient atmosphere and oxygen). The multiferroic/ferroelectric bilayer thin films were composed of 0.8-μ m thickness Bi0.85 Eu0.15 FeO3 and 0.2-μ m thickness of Bi3.2 Y0.8 Ti3 O12 thin film. The effects of annealing atmospheres (ambient atmosphere and oxygen) on the growth and properties of thin films were investigated. The results show that the intensities of the (117) diffraction peak of Bi3.2Y0.8Ti3O 12 film and (110) diffraction peak of Bi0.85Eu0.15FeO3 annealed in oxygen is stronger than those annealed in an ambient atmosphere. The Bi0.85Eu0.15FeO3/Bi3.2Y0.8Ti3O12 bilayer thin films annealed in the oxygen atmosphere exhibit the maximum remanent polarization (2\mbi Pr) and remnant magnetization (2Mr) of 26 μ C/cm2 and 3.44 emu/g, respectively. The improved magnetic and ferroelectric properties can be attributed to the elimination of defects, such as oxygen vacancy and vacancy complexes.

Bi0.9Eu0.1FeO3 (BEFO) thin films were deposited on Pt(111)/Ti/SiO2/Si(100) substrates using the sol-gel method and rapid thermal annealing in an oxygen atmosphere. The effects of annealing temperature (400 ~ 700 C) on microstructure and multiferroic properties of thin films were investigated. The X-ray diffraction analysis showed that the BEFO thin films had an orthorhombic structure. The thin films showed ferroelectric and ferromagnetic properties with remanent polarization (2Pr) of 15 μC/cm2 and remnant magnetization (2Mr) of 4.2 emu/g. The leakage current density (J) of the BEFO thin film annealed at 700 °C was 4.25t10-8& A/cm2 at 150 kV/cm. The leakage current was affected not only by the microstructure but also by the interface between the Pt electrode and the BEFO thin films. Moreover, it was found that more than one conduction mechanism was involved in the electric field range used in these experiments. In the low electric field region, the leakage current was controlled by Poole-Frenkel emission. However, the mechanism could be explained by Schottky emission from the Pt electrode in the high electric field region.