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3 results on '"oxygen plasma etching"'

1. Layer engineering of graphene with oxygen plasma etching.

Author

Rao, Fubo, Li, Wen, and Dong, Lixin

Abstract

A simple and controllable method was developed to engineer the layer number of graphene based on oxygen plasma etching technique. With the optimum parameters, our so-called “one layer etching” process can be used to remove one single graphene layer at a time. As experimental demonstrations, mono-layer graphenes gotten from bi-layer graphenes and the one layer peeling of a few-layer graphene gotten from a graphite flake (∼ 20 nm thick) were presented in this paper. This technique will open up new possibilities for making graphenes with higher efficiency than that of the commonly used mechanical exfoliation method. [ABSTRACT FROM PUBLISHER]

Published
2011
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2. Effects of oxygen plasma etching and post-annealing on Pt Schottky contact on Mg-doped InZnO

Author

Xin-Ping Qu, Yan-Ping Deng, and J.D. Wu

Subjects
Post annealing, Oxygen plasma etching, Materials science, Schottky barrier, Doping, Oxygen plasma, Zinc compounds, Analytical chemistry, Schottky diode
Abstract

Mg-doped InZnO (MIZO) films were prepared by sol-gel method. The surface of the films was treated by oxygen plasma. Pt was then deposited on O 2 -treated films to form MIZO/Pt Schottky diode. The I-V properties of this structure were studied under different oxygen plasma treatment conditions. The experimental results show that oxygen plasma treatment can improve the Schottky properties by minimizing the surface adsorbates and subsurface defects of MIZO films.

Published
2012
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3. High Throughput Cell Electroporation Array Fabricated by Single-Mask Inclined UV Lithography Exposure and Oxygen Plasma Etching

Author

H. Yamamoto, Hidetoshi Kotera, Masao Washizu, Atsuhito Okonogi, Hiroyuki Kabata, Takaaki Suzuki, Masataka Ohoka, and I. Kanno

Subjects
Microchannel, Oxygen plasma etching, Materials science, law, Electroporation, Electrode, Microfluidics, Nanotechnology, Photolithography, Throughput (business), law.invention, Cellular biophysics
Abstract

In this paper, we propose a multiple cell treatment array with high-density arrayed micro-orifice having an individually accessible microchannel and electrodes. More than 10000 micro-orifices with the diameter of 2 mum can be simultaneously fabricated by Single-Mask inclined UV photolithography for embedded network (SIMPLE) process with the oxygen plasma etching. More than 200 living cells immobilized at the arrayed micro-orifices were permeabilized by electroporation and allowed to uptake an foreign impermeant substance.

Published
2007
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