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1. Helium ion microscope characterization for Cu / low-k interconnects - SE imaging and focused helium ion beam luminescence detection

Author

Tomohiko Iijima, Shinichi Ogawa, Toshihiko Kanayama, Shogo Awata, Shintaro Komatani, and Shigeru Kakinuma

Subjects
Interconnection, Materials science, Ion beam, business.industry, Analytical chemistry, chemistry.chemical_element, Dielectric, Copper, Characterization (materials science), chemistry, Optoelectronics, business, Luminescence, Helium, Field ion microscope
Abstract

Several novel imaging modes of the recently developed helium ion microscope (HIM) 1) were explored that may make the HIM a tool of particular value to Cu / low-k (dielectric constant) interconnect structures. Mechanism of the “through dielectric” (2) imaging of the Cu interconnects underneath the low-k SiOC film was proposed, and materials contrast in the low-k regions between Cu lines was imaged which might reflect damaged low-k areas. Furthermore possibility of detection of luminescence induced by the focused helium ion beam using the HIM for materials property characterizations was studied for the first time.

Published
2011

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