1. Polaris - A Low Cost MEMS Fabrication Platform for Navigation-Grade Inertial Sensors
- Author
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Robert MacDonald, Dorin Calbaza, Tammy Johnson, David Lin, Jeremy Popp, Emad Andarawis Andarawis, and Marco Francesco Aimi
- Subjects
Microelectromechanical systems ,Fabrication ,Reliability (semiconductor) ,Materials science ,Through-silicon via ,business.industry ,Etching (microfabrication) ,Optoelectronics ,Silicon on insulator ,Wafer ,business ,Ohmic contact - Abstract
GE Research has developed a low-cost inertial MEMS process flow for navigation-grade inertial sensor fabrication called the ‘Polaris' process. With a total of six mask layers, GE Polaris features thick silicon on insulation (SOI) with a 20 to 200 µm device layer, 30:1 high aspect ratio etching, and wafer level vacuum sealing with through silicon via (TSV) technology. GE Polaris has demonstrated good TSV ohmic contact, good vacuum seal integrity, high wafer yield with good etch symmetry and uniformity, and proven navigation-grade performance with high temperature reliability. GE Polaris strives to provide the simplest MEMS PNT flow for quick prototyping and low-to-mid volume production.
- Published
- 2021