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5. Monte Carlo Study of Si, Ge, and In0.53Ga0.47As n-Channel FinFET Scaling: Channel Orientation, Quantum Confinement, Doping, and Contacts.

7. Enhanced P-Type Behavior in 2D WSe2 via Chemical Defect Engineering

19. Bilayer Pseudospin Junction Transistor (BiSJT) for “Beyond-CMOS” Logic.

20. Short-Term Relaxation in HfOx/CeOx Resistive Random Access Memory With Selector.

21. Laser Spike Annealing for Shallow Junctions in Ge CMOS.

34. Write Error Rate of Spin-Transfer-Torque Random Access Memory Including Micromagnetic Effects Using Rare Event Enhancement.

35. High Phosphorus Dopant Activation in Germanium Using Laser Spike Annealing.

36. Novel BF+ Implantation for High Performance Ge pMOSFETs.

37. Large Magnetoresistance at Room Temperature in Ferromagnet/Topological Insulator Contacts.

40. Exfoliated thin, flexible monocrystalline germanium heterojunction solar cells

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