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The scanning electron microscope (SEM) has gone through a tremendous evolution to become indispensable for many and diverse scientific and industrial applications. The improvements have significantly enriched and augmented the overall SEM performance and have made the instrument far easier to operate. But, the ease of operation also might lead, through operator complacency, to poor results. In addition, the user friendliness has seemingly reduced the need for thorough operator training for using these complex instruments. One might then conclude that the SEM is just a very expensive digital camera or another peripheral device for a computer. Hence, a person using the instrument may be lulled into thinking that all of the potential pitfalls have been eliminated and they believe everything they see on the micrograph is always correct. But, this may not be the case. An earlier paper (Part 1), discussed some of the potential issues related to signal generation in the SEM, instrument calibration, electron beam interactions and the need for physics-based modeling to understand the actual image formation mechanisms. All these were summed together in a discussion of how these issues effect measurements made with the instrument. This second paper discusses another major issue confronting the microscopist: electron-beam-induced specimen contamination. Over the years, NIST has done a great deal of research into the issue of sample contamination and its removal and elimination and some of this work is reviewed and discussed here. SCANNING 36:347-355, 2014. Published 2013. This article is a U.S. Government work and is in the public domain in the USA. [ABSTRACT FROM AUTHOR]

The scanning electron microscope (SEM) has gone through a tremendous evolution to become a critical tool for many and diverse scientific and industrial applications. The high resolution of the SEM is especially suited for both qualitative and quantitative applications especially for nanotechnology and nanomanufacturing. Quantitatively, measurement, or metrology is one of the main uses. It is likely that one of the first questions asked before even the first scanning electron micrograph was ever recorded was: '... how big is that?' The quality of that answer has improved a great deal over the past few years especially since today these instruments are being used as a primary measurement tool on semiconductor processing lines to monitor the manufacturing processes. The well-articulated needs of semiconductor production prompted a rapid evolution of the instrument and its capabilities. Over the past 20 years or so, instrument manufacturers, through substantial semiconductor industry investment of research and development (R&D) money, have vastly improved the performance of these instruments. All users have benefited from this investment, especially where quantitative measurements with an SEM are concerned. But, how good are these data? This article discusses some of the most important aspects and larger issues associated with imaging and measurements with the SEM that every user should know, and understand before any critical quantitative work is attempted. SCANNING 35:355-361, 2013. © 2013 Wiley Periodicals, Inc. SCANNING 35:???-???, 2013. © 2013 Wiley Periodicals, Inc. [ABSTRACT FROM AUTHOR]