1. An ionization region model of the reactive Ar/O 2 high power impulse magnetron sputtering discharge
- Author
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Daniel Lundin, Tiberiu Minea, Jon Tomas Gudmundsson, Chunqing Huo, Michael A. Raadu, Nils Brenning, Laboratoire de physique des gaz et des plasmas (LPGP), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), School of Electrical Engineering [Stockholm], and Royal Institute of Technology [Stockholm] (KTH )
- Subjects
010302 applied physics ,Electron density ,Materials science ,02 engineering and technology ,Plasma ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,01 natural sciences ,Charged particle ,Ion ,Sputtering ,[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph] ,Ionization ,0103 physical sciences ,High-power impulse magnetron sputtering ,Atomic physics ,0210 nano-technology ,ComputingMilieux_MISCELLANEOUS ,A titanium - Abstract
A new reactive ionization region model (R-IRM) is developed to describe the reactive Ar/O-2 high power impulse magnetron sputtering (HiPIMS) discharge with a titanium target. It is then applied to ...
- Published
- 2016
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