1. Fabrication and characterization of a Mo/Si multilayer monochromator with a narrow spectral bandwidth in the xuv domain
- Author
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R. Barchewitz, Gwaénäelle Julie, P. Troussel, Françoise Bridou, René Laval, Rabah Benbalagh, F. Delmotte, Alain Raynal, Jean-Michel André, Alain Bosseboeuf, and Marie-Françoise Ravet
- Subjects
Physics ,Nuclear and High Energy Physics ,Fabrication ,business.industry ,Synchrotron radiation ,X-ray optics ,Grating ,law.invention ,Optics ,law ,Extreme ultraviolet ,Optoelectronics ,Photolithography ,Reactive-ion etching ,business ,Instrumentation ,Monochromator - Abstract
A new kind of xuv multilayer monochromator with a narrow spectral bandwidth is introduced. This monochromator is based on a Mo/Si multilayer mirror etched according to the profile of a lamellar grating. The fabrication of such a device involving multilayer deposition, UV lithography and reactive ion etching is presented. The monochromator has been characterized by means of the synchrotron radiation around the Si–L edge (100 eV). A reduction of the bandwidth has been observed with respect to the unpatterned mirror by a factor close to 3.
- Published
- 2001
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