1. Microstructure analysis of IrO 2 thin films
- Author
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Takahisa Yamamoto, Mikk Lippmaa, Ryota Takahashi, and Xiuyi Hou
- Subjects
Materials science ,Analytical chemistry ,02 engineering and technology ,Conductivity ,021001 nanoscience & nanotechnology ,Condensed Matter Physics ,Epitaxy ,Microstructure ,01 natural sciences ,Pulsed laser deposition ,Inorganic Chemistry ,Crystallography ,Transmission electron microscopy ,Torr ,0103 physical sciences ,Materials Chemistry ,Grain boundary ,Thin film ,010306 general physics ,0210 nano-technology - Abstract
We have grown IrO2 thin films on TiO2(110) substrates to determine the pulsed laser deposition growth window for iridates. Relaxed IrO2 films were obtained at a growth temperature of 500 °C and background oxygen pressure of 100 m Torr; otherwise, either pure Ir metal films or evaporative Ir loss were observed. Although x-ray Φ-scan measurement indicated that the films were epitaxial, a distinct grain structure was seen by atomic force microscopy and transmission electron microscopy. The grain boundaries were found to limit the conductivity of films at low temperature. It appeared that strain relaxation leads to stacking faults at grain boundaries.
- Published
- 2017