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Group III-nitride semiconductors exhibit many ideal characteristics for solar water splitting, including a tunable energy bandgap across nearly the entire solar spectrum and suitable band edge positions for water oxidation and proton reduction under visible and near-infrared light irradiation. To date, however, the best reported energy conversion efficiency for III-nitride semiconductor photocathodes is still below 1%. Here we report on the demonstration of a relatively efficient p-type In0.42Ga0.58N photocathode, which is monolithically integrated on an n-type nonplanar Si wafer through a GaN nanowire tunnel junction. The open pillar design, together with the nonplanar Si wafer can significantly maximize light trapping, whereas the tunnel junction reduces the interfacial resistance and enhances the extraction of photo-generated electrons. In addition, photodeposited Pt nanoparticles on InGaN nanowire surfaces significantly improve the cathodic performance. The nanowire photocathode exhibits a photocurrent density of 12.3 mA cm−2 at 0 V vs. RHE and an onset potential of 0.79 V vs. RHE under AM 1.5 G one-sun illumination. The maximum applied bias photon-to-current efficiency reaches 4% at ~0.52 V vs. RHE, which is one order of magnitude higher than the previously reported values for III-nitride photocathodes. Significantly, no performance degradation was measured for over 30 h solar water splitting with a steady photocurrent density ~12 mA cm−2 without using any extra surface protection, which is attributed to the spontaneous formation of N-terminated surfaces of InGaN nanowires to protect against photocorrosion.

We have investigated the nature of Al0.56Ga0.44N/Al0.62Ga0.38N multiquantum wells grown by plasma-assisted molecular beam epitaxy for application in deep-ultraviolet light emitters. Excitation and temperature-dependent and time-resolved photoluminescence measurements and transmission and reflectance spectroscopy have been complemented by high-angle annular dark field scanning transmission electron microscopy. The 3 nm quantum wells are characterized by interface roughness having a height of 0.3–1 nm and the maximum value is in excellent agreement with values obtained from calculations done to analyze the measured photoluminescence lineshape. The radiative lifetime increases with temperature, suggesting the role of electron-hole scattering to cool photoexcited carriers to the ground state of the quantum wells.