1. EUV laser produced plasma source development
- Author
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William N. Partlo, Georgiy O. Vaschenko, Christopher P. Chrobak, David W. Myers, Oleh V. Khodykin, Alexander N. Bykanov, Alex I. Ershov, Nigel R. Farrar, Norbert R. Bowering, Igor V. Fomenkov, David C. Brandt, and Jerzy R. Hoffman
- Subjects
business.industry ,Extreme ultraviolet lithography ,chemistry.chemical_element ,Plasma ,Condensed Matter Physics ,Laser ,Reflectivity ,Atomic and Molecular Physics, and Optics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,law.invention ,Optics ,chemistry ,law ,Optoelectronics ,Electrical and Electronic Engineering ,business ,Tin - Abstract
This paper describes the development of a LPP EUV source using a CO"2 laser with tin droplet targets. Burst power of 100W and average power of 25W has been achieved. Collector mirrors have been fabricated with >50% reflectivity and show stable EUV images. Multiple debris mitigation techniques preserve mirror reflectivity. Manufacturing of the first production systems is in progress.
- Published
- 2009
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