39 results on '"Anders, André"'
Search Results
2. High-quality transparent conductive indium oxide film deposition by reactive pulsed magnetron sputtering: Determining the limits of substrate heating
3. Cathode spot behavior in nitrogen and oxygen gaseous atmospheres and concomitant cathode surface modifications
4. Unravelling the ion-energy-dependent structure evolution and its implications for the elastic properties of (V,Al)N thin films
5. Reduced atomic shadowing in HiPIMS: Role of the thermalized metal ions
6. Phase tailoring of tantalum thin films deposited in deep oscillation magnetron sputtering mode
7. Element- and charge-state-resolved ion energies in the cathodic arc plasma from composite AlCr cathodes in argon, nitrogen and oxygen atmospheres
8. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)
9. Estimating electron drift velocities in magnetron discharges
10. Modeling of optical and energy performance of tungsten-oxide-based electrochromic windows including their intermediate states
11. Transparent and conductive indium doped cadmium oxide thin films prepared by pulsed filtered cathodic arc deposition
12. Discharge physics of high power impulse magnetron sputtering
13. High power impulse magnetron sputtering and related discharges: Scalable plasma sources for plasma-based ion implantation and deposition
14. A structure zone diagram including plasma-based deposition and ion etching
15. High quality ZnO:Al transparent conducting oxide films synthesized by pulsed filtered cathodic arc deposition
16. A discussion on the absence of plasma in spark plasma sintering
17. Electrical properties of a-C: Mo films produced by dual-cathode filtered cathodic arc plasma deposition
18. Electrochromically switched, gas-reservoir metal hydride devices with application to energy-efficient windows
19. Coalescence of magnetron-sputtered silver islands affected by transition metal seeding (Ni, Cr, Nb, Zr, Mo, W, Ta) and other parameters
20. Structural and optical evaluation of WOxNy films deposited by reactive magnetron sputtering
21. Erratum to “Plasma biasing to control the growth conditions of diamond-like carbon” [Surface and Coatings Technology 201(2007) 4628–4632]
22. Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
23. Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering
24. Plasma biasing to control the growth conditions of diamond-like carbon
25. Structural, optical, and electrical properties of WOx(Ny) films deposited by reactive dual magnetron sputtering
26. Smoothing of ultrathin silver films by transition metal seeding
27. Physics of arcing, and implications to sputter deposition
28. Plasma and ion sources in large area coating: A review
29. Fundamentals of pulsed plasmas for materials processing
30. From plasma immersion ion implantation to deposition: a historical perspective on principles and trends
31. Arc-discharge ion sources for heavy ion fusion
32. Width, structure and stability of sheaths in metal plasma immersion ion implantation and deposition: measurements and analytical considerations
33. Measurements of secondary electrons emitted from conductive substrates under high-current metal ion bombardment
34. Twist filter for the removal of macroparticles from cathodic arc plasmas
35. Review of cathodic arc deposition technology at the start of the new millennium
36. Approaches to rid cathodic arc plasmas of macro- and nanoparticles: a review
37. Metal plasma immersion ion implantation and deposition: a review
38. High energy metal ion implantation using a novel, broad-beam, Marx-generator-based ion source “Magis”
39. Increasing the retained dose by plasma immersion ion implantation and deposition
Catalog
Books, media, physical & digital resources
Discovery Service for Jio Institute Digital Library
For full access to our library's resources, please sign in.