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Abstract: We study the diffusion of self-interstitial atoms (SIAs) and SIA clusters in vanadium via molecular dynamics simulations with an improved Finnis–Sinclair potential (fit to first-principles results for SIA structure and energetics). The present results demonstrate that single SIAs exist in a 〈111〉-dumbbell configuration and migrate easily along 〈111〉 directions. Changes of direction through rotations into other 〈111〉 directions are infrequent at low temperatures, but become prominent at higher temperatures, thereby changing the migration path from predominantly one-dimensional to almost isotropically three-dimensional. SIA clusters (i.e., clusters of 〈111〉-dumbbells) can be described as perfect prismatic dislocation loops with Burgers vector and habit planes of 1/2〈111〉{220} that migrate only along their glide cylinder. SIA clusters also migrate along 〈111〉-directions, but do not rotate. Both single SIAs and their clusters exhibit a highly non-Arrhenius diffusivity, which originates from a combination of a temperature dependent correlation factor and the presence of very low migration barriers. At low temperature, the diffusion is approximately Arrhenius, while above room temperature, the diffusivity is a linear function of temperature. A simple model is proposed to describe these diffusion regimes and the transition between them. [Copyright &y& Elsevier]

A systematic theoretical analysis is presented of the combined effects of substrate compliance and film compositional grading on the relaxation of strain due to lattice mismatch in layer-by-layer semiconductor heteroepitaxy. The analysis is based on a combination of continuum elasticity theory and a novel atomistic simulation approach for modeling structural and compositional relaxation in layer-by-layer heteroepitaxial systems. Results are presented for InAs epitaxy on GaAs(1 1 1)A compliant substrates with some marginal film compositional grading that consists of one monolayer of In0.50Ga0.50As grown on the substrate surface prior to InAs growth. A parametric study is carried out over a wide range of substrate thicknesses. Interfacial stability with respect to misfit dislocation formation, the dependence on substrate thickness of a thermodynamic critical film thickness, and the completion of the coherent-to-semicoherent interfacial transition are examined in detail. In addition, the structural characteristics and compositional distribution of the corresponding semicoherent interfaces, the associated strain fields, as well as the film surface morphological characteristics are analyzed. Most importantly, the role of segregation at defects of a semicoherent interface in the thermodynamics of layer-by-layer heteroepitaxial growth is demonstrated. Our study shows that systematic combination of the mechanical behavior of thin compliant substrates with grading of the epitaxial film composition provides a very promising engineering strategy for strain relaxation in heteroepitaxy. [Copyright &y& Elsevier]

A systematic study is presented of interfacial stability and strain relaxation through misfit dislocation formation in III–V semiconductor layer-by-layer heteroepitaxy. A multiscale modeling strategy is developed that links continuum elasticity theory with atomistic structural relaxation and Monte Carlo simulations using a valence force field description of interatomic interactions. Results are presented for the energetics of the transition from a coherent to a semicoherent film/substrate interface consisting of a misfit dislocation network, the semicoherent interface structures, the associated strain fields, and the film surface morphological characteristics for InAs epitaxy on GaAs(1 1 1)A. The capability of continuum elasticity theory to provide a satisfactory description of the atomistic simulation results is discussed. In addition, using thin compliant substrates and grading the composition of the deposited film are demonstrated to have beneficial effects on film strain relaxation. Furthermore, the dynamics of strain relaxation is analyzed based on a phenomenological mean-field theoretical framework. Our theoretical results are in very good agreement with our experimental measurements on InAs/GaAs(1 1 1)A samples for films grown by molecular beam epitaxy on thick and thin GaAs buffer layers. [Copyright &y& Elsevier]