1. Review on photocatalytic nitrogen fixation by local surface plasmon.
- Author
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Tian, Jianrong, Zhao, Zhixi, Ling, Huaqing, Zhang, Ziqi, Ablat, Hadiya, and Nurmamat, Xamsiya
- Subjects
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DOPED semiconductors , *SEMICONDUCTOR doping , *HOT carriers , *QUANTUM efficiency , *RESONANCE effect - Abstract
Plasmon-induced photocatalysis showed great potential to improve the photocatalytic nitrogen fixation efficiency, due to the localized surface plasmon resonance effect. The performances of the photocatalytic nitrogen fixation were evaluated by ammonia production rate, apparent quantum efficiency, solar-to-ammonia efficiency, and turnover frequency. The ammonia production rate was compared with three kinds of catalyst, i.e. nano-metals, nano-metal modified semiconductors and highly doped semiconductors. The outstanding contributions of hot electron injection effect, near-field enhancement effect, photothermal effect to nitrogen fixation efficiency were described. The creation of active sites, construct vacancies, and doping regulation were effective methods to prepare high performance catalysts for photocatalytic nitrogen fixation. • Nano-metal-modified semiconductor catalysts achieve ammonia production rate of 785 μmol g−1 h−1. • Highiy doped semiconductors re-define the landscape of photocatalytic NH 3 generation. • The ammonia production rate, apparent quantum efficiency and Solar-to-Ammonia can be used to evaluate the performance ofphotocatalyst. • Hot electron injection effect as a guide for the synthesis of plasma-induced photocatalysts. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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