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Abstract: The benefits of allyl prepolymers for nanoimprint lithography (NIL) are investigated. Allyl prepolymers cure during the imprint process as a result of heating. They have the potential to enable NIL at lower temperatures, while the imprinted patterns show high thermal stability in contrast to thermoplastic polymers, where the thermal behaviour of the imprinted patterns is strictly determined by the glass transition temperature (T g) of the polymer. Allyl prepolymers reported here are modified with the aim of obtaining high quality imprints at decreased imprint temperature and reduced cycle time of the imprint process. Free-radical initiators are applied to increase the polymerization rate and to let the polymerization start at lower temperatures. Adding plasticizers results in a decrease in T g. Most favourable systems are selected out of a variety of various mixtures for imprint tests. [Copyright &y& Elsevier]