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Your search keyword '"Boratto, Miguel Henrique"' showing total 2 results
Start Over Author "Boratto, Miguel Henrique" Publisher elsevier b.v.
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2. Deposition of Al2O3 by resistive evaporation and thermal oxidation of Al to be applied as a transparent FET insulating layer.

Author

Boratto, Miguel Henrique and de Andrade Scalvi, Luis Vicente

Subjects
*FIELD-effect transistors, *ALUMINUM oxide, *ELECTROPLATING, *EVAPORATION (Chemistry), *THERMAL oxidation (Materials science), *THIN films, *RAMAN spectroscopy
Abstract

Abstract: Alumina thin films have been obtained by resistive evaporation of Al layer, followed by thermal oxidation by means of annealing in appropriate atmosphere (air or O2-rich), with variation of annealing time and temperature. Optical and structural properties of the investigated films reveal that the temperature of 550°C is responsible for reasonable oxidation, which is accelerated up to 8 times for O2-rich atmosphere. Results of surface electrical resistivity and Raman spectroscopy are in good agreement with these findings. Surprisingly, X-ray and Raman data suggest also the crystallization of Si nuclei at glass substrate–alumina interface, which would come from the soda-lime glass used as substrate. [Copyright &y& Elsevier]

Published
2014
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