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Zirconium oxide (ZrO 2) thin films were grown onto 316L stainless steel by radio frequency magnetron sputtering (RFMS), at different substrate D.C. bias voltages (from 0 to −100 V). The deposition was performed using a pure zirconium target in the presence of an Ar-O 2 gas mixture. The characterization of the deposited films was performed using scanning Electron Microscope, atomic Force Microscopy, X-rays diffraction, Raman spectroscopy, nanoindentation and potentiodynamic polarization. The structures of all ZrO 2 films are crystalline. The monoclinic phase is predominant in the grounded films (0 V). However, the application of bias voltage depicts a tetragonal phase. Nanoindentation results reveal promoted values of the hardness of the ZrO 2 films. Corrosion behavior of the films was studied in Hank's solution using the potentiodynamic polarization method. The comparison between the uncoated samples and the coated ones showed a reduction in corrosion current density for coated samples. The minimum corrosion rate of the film deposited at −100 V was 0.04992 mpy, which is about 18 times less than that of the uncoated steel (0.88135 mpy). The optimum anti-corrosion performance and hardness were obtained for ZrO 2 deposited at a bias voltage of −100 V. • ZrO 2 films were deposited by magnetron sputtering from a metallic Zr target using oxygen as reactive gas. • ZrO 2 films with high hardness and high protective efficiency (94%) are demonstrated. • The hardness increases with the bias voltage applied to substrate. • Corrosion resistance is affected by negative bias voltage of ZrO 2 film. [ABSTRACT FROM AUTHOR]