1. Modeling of nanolithography processes
- Author
-
Lawrence S. Melvin and Artak Isoyan
- Subjects
Nanolithography ,Materials science ,Mathematical model ,business.industry ,Computation ,Design pattern ,Extreme ultraviolet lithography ,Electronic engineering ,Microelectronics ,Wafer ,business ,Lithography - Abstract
Mathematical models of semiconductor processes are heavily used within the microelectronics manufacturing industry. They are used to design and understand molecular-level effects, comprehend and develop local patterning processes, and modify the design pattern to better image the desired pattern on a wafer. To accomplish these tasks, different model types are developed including molecular models, bulk models, and compact models. All models and model applications must resolve the interaction between the competing effects of model computation time and model accuracy. This chapter discusses the basics of mathematical models used for optical, EUV, and e-beam lithography modelings.
- Published
- 2014