1. Electronic properties of ion irradiated amorphous carbon films prepared by plasma assisted CVD method
- Author
-
Ahmed Sayeed, V. Meenakshi, S. V. Subramanyam, Somnath Bhattacharyya, and D. Kanjilal
- Subjects
Physics ,Analytical chemistry ,Electronic structure ,Conductivity ,Condensed Matter Physics ,Surfaces, Coatings and Films ,Amorphous solid ,Ion ,Carbon film ,Amorphous carbon ,X-ray photoelectron spectroscopy ,Irradiation ,Atomic physics ,Instrumentation - Abstract
Amorphous hydrogenated carbon films were prepared by plasma assisted CVD method. Their dc conductivity was studied as a function of temperature in the range of 300 K to 10 K. Films were then subjected to high energy (170 MeV) ion irradiation. After irradiation a marked change was observed in the conductivity and its temperature dependence. The conductivity decreased by 2–3 orders of magnitude and a gap appeared in the electronic structure. UPS studies of the material show a decrease in the π states of the electronic density of states spectrum. A change in the C1s peak shape was observed in XPS study of the irradiated carbon film.
- Published
- 1996