1. Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths
- Author
-
E. Caden, S. Rescia, D. Fairbank, G. St-Hilaire, Thilo Michel, A. Craycraft, Jens Dilling, I. Badhrees, A. De St. Croix, X. S. Jiang, C. Licciardi, J. Farine, M. Walent, S. Feyzbakhsh, V. Belov, C.R. Natzke, B. G. Lenardo, A. Robinson, P. Nakarmi, A. Der Mesrobian-Kabakian, T. Brunner, L. Darroch, J. Echevers, Xuan Wu, S. Parent, A. Odian, A. Fucarino, Jean-Francois Pratte, Yu-Guang Zhou, E. Raguzin, T. Rossignol, Z. Li, O. Nusair, J. L. Vuilleumier, R. Krücken, M. Hughes, V. Veeraraghavan, M. J. Jewell, R. Saldanha, T. I. Totev, P. A. Breur, K. Skarpaas, Gerard Visser, S. Al Kharusi, I. Ostrovskiy, B. T. Cleveland, A. Kuchenkov, Liangjian Wen, Luca Doria, Guofu Cao, Samuele Sangiorgio, Wei Wei, K. S. Kumar, Mike Richman, David Moore, O. Njoya, A. Iverson, T. Bhatta, M. Chiu, G. S. Li, Thomas Tsang, Shu Li, Y. Lan, B. Chana, Douglas H Beck, L. Yang, M. Oriunno, J. P. Brodsky, P. S. Barbeau, He-Run Yang, R. DeVoe, K. Murray, J. Watkins, M. Tarka, Gisela Anton, R. Tsang, M. L. di Vacri, K. Odgers, M. J. Dolinski, M. Medina-Peregrina, C. Vivo-Vilches, F. Retiere, U. Wichoski, Sergio Ferrara, O. Zeldovich, K. G. Leach, T. Ziegler, R. Gornea, K. Deslandes, David Leonard, Giorgio Gratta, Thomas Koffas, W. M. Fairbank, Wei Wu, R.J. Newby, P. C. Rowson, T. Stiegler, M. Elbeltagi, Lorenzo Fabris, J. Hobl, A. House, N. Roy, L. Cao, F. Nolet, N. Massacret, T. McElroy, S. X. Wu, F. Vachon, C. Chambers, R. MacLellan, A. Pocar, V.N. Stekhanov, P. Gautam, F. Edaltafar, D. Goeldi, M. Coon, I. J. Arnquist, J. Runge, Cory T. Overman, M. Heffner, S. Viel, G. Gallina, Angelo Dragone, Gabriele Giacomini, P. Lv, A. Piepke, J. Todd, Y. Y. Ding, Veljko Radeka, T. Wager, Qun-Yao Wang, Zhijun Ning, E. V. Hansen, A. Jamil, Arun Kumar Soma, Qing Xia, S. Byrne Mamahit, Ethan Brown, A. Karelin, G. S. Ortega, M. Wagenpfeil, J. Dalmasson, X.L. Sun, J. B. Zhao, A. Larson, Serge A. Charlebois, John L. Orrell, T. Daniels, B. Mong, L. J. Kaufman, and Eric W. Hoppe
- Subjects
Nuclear and High Energy Physics ,Materials science ,Physics - Instrumentation and Detectors ,Silicon ,chemistry.chemical_element ,Photodetector ,FOS: Physical sciences ,01 natural sciences ,7. Clean energy ,High Energy Physics - Experiment ,High Energy Physics - Experiment (hep-ex) ,Xenon ,Silicon photomultiplier ,0103 physical sciences ,Wafer ,Electrical and Electronic Engineering ,010308 nuclear & particles physics ,business.industry ,Instrumentation and Detectors (physics.ins-det) ,Nuclear Energy and Engineering ,chemistry ,Optoelectronics ,Diffuse reflection ,Photonics ,business ,Refractive index - Abstract
Characterization of the vacuum ultraviolet (VUV) reflectance of silicon photomultipliers (SiPMs) is important for large-scale SiPM-based photodetector systems. We report the angular dependence of the specular reflectance in a vacuum of SiPMs manufactured by Fondazionc Bruno Kessler (FBK) and Hamamatsu Photonics K.K. (HPK) over wavelengths ranging from 120 nm to 280 nm. Refractive index and extinction coefficient of the thin silicon-dioxide film deposited on the surface of the FBK SiPMs are derived from reflectance data of a FBK silicon wafer with the same deposited oxide film as SiPMs. The diffuse reflectance of SiPMs is also measured at 193 nm. We use the VUV spectral dependence of the optical constants to predict the reflectance of the FBK silicon wafer and FBK SiPMs in liquid xenon.
- Published
- 2019
- Full Text
- View/download PDF