8 results on '"Gujrathi S"'
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2. Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers
3. Influence of substrate bias voltage on the properties of CNx films prepared by reactive magnetron sputtering
4. Effect of in situ plasma oxidation of TiN diffusion barrier for AlSiCu/TiN/Ti metallization structure of integrated circuits
5. Plasma-deposited silicon oxide and silicon nitride films on poly(ethylene terephthalate): A multitechnique study of the interphase regions
6. Effect of the Ti/TiN bilayer barrier and its surface treatment on the reliability of a Ti/TiN/AlSiCu/TiN contact metallization
7. Etching of a‐C:H films by an atomic oxygen beam
8. Hydrogen profiling by elastic recoil detection in microcrystalline germanium thin films
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