1. Characterization of High Dose Mn, Fe, and Ni implantation intop-GaN
- Author
-
S. N. G. Chu, Andrei Osinsky, J. M. Van Hove, C. R. Abernathy, Nikoleta Theodoropoulou, Robert G. Wilson, Peter Chow, J. M. Zavada, Alexander Y. Polyakov, G. T. Thaler, Arthur F. Hebard, P. E. Norris, Stephen J. Pearton, Yun Daniel Park, M. E. Overberg, and A. M. Wowchack
- Subjects
Materials science ,Condensed matter physics ,Annealing (metallurgy) ,Analytical chemistry ,Surfaces and Interfaces ,Condensed Matter Physics ,Surfaces, Coatings and Films ,Magnetization ,Ion implantation ,Electron diffraction ,Transmission electron microscopy ,X-ray crystallography ,Curie temperature ,Selected area diffraction - Abstract
The magnetization of p-GaN or p-AlGaN/GaN superlattices was measured after implantation with high doses (3–5×1016 cm−2) of Mn, Fe, or Ni and subsequent annealing at 700–1000 °C. The samples showed ferromagnetic contributions below temperatures ranging from 190–250 K for Mn to 45–185 K for Ni and 80–250 K for Fe. The use of superlattices to enhance the hole concentration did not produce any change in ferromagnetic ordering temperature. No secondary phase formation was observed by x-ray diffraction, transmission electron microscopy, or selected area diffraction pattern analysis for the doses we employed.
- Published
- 2002